Barrier and electrode properties of high Tc Josephson junctions formed by a plasma discharge process

✍ Scribed by E. Aharoni; G. Koren; E. Polturak; D. Cohen

• Book ID: 103946973
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 328 KB
• Volume: 209
• Category: Article
• ISSN: 0921-4534
• DOI: 10.1016/0921-4534(93)90909-a

✦ Synopsis

The influence of rf discharge in CF4 and O~ gases on the properties of thin YBCO films and edge junctions was investigated by transport ,neasurements and Auger spectroscopy. It was found that oxygen plasma of short duration can serve as a cleaning step before tile formation of the barrier. In contrast, CF4 plasma tends to substitute oxygen in the superconducting film by fluorine which yield an insulating layer. A CF4 plasma discharge of more than one minute turns the YBCO film irreversibly into an insulator. At shorter durations, tile deterioration of the films is limited to a thickness of the order of few tens of angstroms.