Barriers formed by a plasma discharge process in all YBCO Josephson edge junctions

✍ Scribed by E. Aharoni; G. Koren

• Book ID: 103947401
• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 145 KB
• Volume: 235-240
• Category: Article
• ISSN: 0921-4534
• DOI: 10.1016/0921-4534(94)91196-7

✦ Synopsis

All YBCO Josephson edge junctions were prepared with a barrier formed by an rf plasma discharge under different conditions. The structure of the barrier and the transport properties of these junctions, have been investigated. Under typical plasma conditions of 30-60 s plasma of 50-80 W at 100 mTorr of CF 4 gas, and 500-600 °C, we found that the junctions behaved like weak links. The normal resistance was of the order of a few ~2, with a minimum at around 50 K, .typical to localization versus temperature. The temperature dependence of the critical current. I c, was found to be I c oc (T~ -T) 15. This reflects the asymmetric structure of