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Triethylamine-sensitized photopolymerization of styrene

โœ Scribed by Kenji Yokota; Hideo Tomioka; Ken'ichiro Adachi

Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
385 KB
Volume
14
Category
Article
ISSN
0032-3861

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The photopolymerization of methyl methacrylate (MMA) sensitized by tris(2,2@-bipyridine)iron(III) complex, was studied at 35ยกC in the [Fe(bpy) 3 ]3`, presence of an electron donor, triethylamine (TEA) with UV radiation of wavelength 254 nm. The initial rate of polymerization, shows a linear dependen