Effect of solvent on anthraquinone-sensitized photopolymerization of methyl methacrylate
โ Scribed by Zhu-Ten Li; Hitoshi Kubota; Yoshitaka Ogiwara
- Publisher
- John Wiley and Sons
- Year
- 1982
- Tongue
- English
- Weight
- 298 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0021-8995
No coin nor oath required. For personal study only.
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The photopolymerization of methyl methacrylate (MMA) sensitized by tris(2,2@-bipyridine)iron(III) complex, was studied at 35ยกC in the [Fe(bpy) 3 ]3`, presence of an electron donor, triethylamine (TEA) with UV radiation of wavelength 254 nm. The initial rate of polymerization, shows a linear dependen
## SYNOPSIS Methyl methacrylate was grafted onto polypropylene films using gamma radiation. Effects of different parameters, such as radiation dose, inhibitor concentration, monomer concentration, and type of solvents on the graft yield were investigated. It was established that the graft yield de