We have realized two dimensional electron gases (2DEGs) in tensile strained silicon (Si) channels between strain relaxed silicon germanium (Si0.70Ge0.3o) barriers grown on Si(100) substrates by Gas Source Molecular Beam Epitaxy (GSMBE). Disilane (Si2Hs), germane (GeH4), and arsine (AsHa) are used as
Transport properties of the two-dimensional electron gas in GaN/AlGaN heterostructures grown by ammonia molecular-beam epitaxy
β Scribed by Pogosov, A. G. ;Budantsev, M. V. ;Lavrov, R. A. ;Mansurov, V. G. ;Nikitin, A. Yu. ;Preobrazhenskii, V. V. ;Zhuravlev, K. S.
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 184 KB
- Volume
- 203
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
Transport properties of the twoβdimensional electron gas in AlGaN/GaN heterostructures grown by ammonia molecularβbeam epitaxy are experimentally investigated. Conventional Hall and Shubnikovβde Haas measurements as well as investigations of quantum transport phenomena are reported. It is found that negative magnetoresistance (NMR) caused by weak localization demonstrates an unusual behavior at low temperature (1.8 K). The observed NMR cannot be described by the ordinary theory of quantum corrections to conductivity based on a single phase breaking time Ο~Ο~ . The anomalous NMR behavior can be explained by the presence of two occupied quantum subbands, characterized by their own phase breaking times Ο ~Ο 1~ and Ο ~Ο 2~. (Β© 2006 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
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