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Transmission electron microscopy and X-ray photoelectron spectroscopy investigations of the MoCuInSe2 interface

✍ Scribed by K.M. Jones; L.L. Kazmerski; B.G. Yacobi


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
184 KB
Volume
116
Category
Article
ISSN
0040-6090

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Investigation of an Mo/SiO2 interface by
✍ Jonnard, P.; Bonnelle, C.; Bosseboeuf, A.; Danaie, K.; Beauprez, E. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 89 KB 👁 1 views

We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize