𝔖 Bobbio Scriptorium

✦ LIBER ✦

Transient boron diffusion in ion-implanted crystalline and amorphous silicon: T O Sedgwick et al, J appl Phys, 63, 1988, 1452–1463

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 153 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90873-7

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