Top-gated few-electron double quantum dot in Si/SiGe
โ Scribed by Nakul Shaji; Christine B. Simmons; Levente J. Klein; Hua Qin; Donald E. Savage; M.G. Lagally; Susan N. Coppersmith; Robert Joynt; Mark Friesen; Robert H. Blick; Mark A. Eriksson
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 556 KB
- Volume
- 40
- Category
- Article
- ISSN
- 1386-9477
No coin nor oath required. For personal study only.
โฆ Synopsis
A few-electron quantum dot utilizing Schottky, metal top gates in a modulation doped Si/SiGe heterostructure was realized and nonlinear transport through the dot was studied. By carefully tuning the capacitively coupled gates, the single quantum dot was transformed into two tunnel-coupled quantum dots in series. The resulting double quantum dot was tuned to the few-electron regime and the charge stability diagram was studied as a function of the gate voltages. Understanding of such a double dot system is essential for the practical implementation of exchange-mediated multi-qubit systems in silicon devices.
๐ SIMILAR VOLUMES
For the study of spin-dependent transport in narrow-gap semiconductor nanostructures, we fabricated a few-electron quantum dot based on an In 0.56 Ga 0.44 As resonant tunneling diode structure with an Al 2 O 3 gate insulator formed by atomic layer deposition and an air-bridge drain electrode. This g