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Top-gated few-electron double quantum dot in Si/SiGe

โœ Scribed by Nakul Shaji; Christine B. Simmons; Levente J. Klein; Hua Qin; Donald E. Savage; M.G. Lagally; Susan N. Coppersmith; Robert Joynt; Mark Friesen; Robert H. Blick; Mark A. Eriksson


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
556 KB
Volume
40
Category
Article
ISSN
1386-9477

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โœฆ Synopsis


A few-electron quantum dot utilizing Schottky, metal top gates in a modulation doped Si/SiGe heterostructure was realized and nonlinear transport through the dot was studied. By carefully tuning the capacitively coupled gates, the single quantum dot was transformed into two tunnel-coupled quantum dots in series. The resulting double quantum dot was tuned to the few-electron regime and the charge stability diagram was studied as a function of the gate voltages. Understanding of such a double dot system is essential for the practical implementation of exchange-mediated multi-qubit systems in silicon devices.


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