Tone control in dry development of photosensitive polyimides

✍ Scribed by J Muñoz; C Domínguez

• Book ID: 104265952
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 941 KB
• Volume: 49
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(97)00126-7

✦ Synopsis

A dry-developed photosensitive polyimide process has been widely studied as a top surface imaging technique for photoresist applications in microsystem technology. Photografting of photoimageable polyimides are obtained by using a silicon-based monomer having methacrylate sensitizer group, analogous to that contained into the polyamic precursor resist. For this purpose standard UV lithograph y exposure is employed. The modified surface is retarding the oxygen reactive ion etching process, while the resist pattern containing the Si-containing compound is remaining. Processing steps sequenced in different order are resulting in both positive-and negative-tone patterns after development by oxygen reactive ion etching.