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TiO2 films in the rutile and anatase phases produced by inductively coupled RF plasmas

✍ Scribed by R. Valencia-Alvarado; R. López-Callejas; S.R. Barocio; A. Mercado-Cabrera; R. Peña-Eguiluz; A.E. Muñoz-Castro; A. de la Piedad-Beneitez; J.M. de la Rosa-Vázquez


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
839 KB
Volume
204
Category
Article
ISSN
0257-8972

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✦ Synopsis


High-frequency and RF discharges Biomaterials Raman spectroscopy in chemical analysis Films of titanium dioxide (TiO 2 ) in the rutile and anatase phases have been obtained in a cylindrical pyrexlike glass vessel inductively coupled to a 13.56 MHz radio frequency generator. Rutile films were developed from commercially pure (CpTi) titanium samples used as targets in an argon/oxygen plasma. Each CpTi target was biased at -3000 V by means of a direct current supply. The plasma ion acceleration at such a potential leads to a kinetic energy transference to the target whose temperature rises to ∼ 670 °C, favourable to the rutile formation. The anatase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates. The latter were placed 3 cm away from the target. The substrates attained a temperature resulting from the amount of heat transferred by the plasma particles, in turn, a function of the plasma parameters. Thus, under the prevailing experimental conditions, substrate temperatures lay in the ∼ 280 to 325 °C range. Atomic titanium is assumed to be sputtered out of the target and oxidised, evolving into the anatase phase on the surface of the glass or silicon. The obtained film phases did not require annealing after the plasma oxidation process. The characterisation of the film samples was conducted by means of X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM).


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## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl