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Third dimension of proximity effect correction (PEC)

✍ Scribed by Nezih Unal; Diana Mahalu; Olga Raslin; Daniel Ritter; Christoph Sambale; Ulrich Hofmann


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
332 KB
Volume
87
Category
Article
ISSN
0167-9317

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In a raster scan lithography system, it is possible to correct proximity effects while the pattern is being exposed. This technique will be called run-time proximity correction. It is quite different from conventional methods that preprocess pattern data before exposure. It is a user transparent par