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Thin vapour-deposited niobium pentoxide films

โœ Scribed by J.J. Van Glabbeek; R.E. Van de Leest


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
519 KB
Volume
201
Category
Article
ISSN
0040-6090

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Chemical Vapor Deposition of Niobium Dis
โœ Claireย J. Carmalt; Emilyย S. Peters; Ivanย P. Parkin; Troyย D. Manning; Andrewย L. H ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 175 KB ๐Ÿ‘ 2 views

## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250โˆ’600 ยฐC. The niobium sulfide films grown at temperatures above 500 ยฐC we