## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogenβbased gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea
β¦ LIBER β¦
Thin nanocrystalline diamond films deposited by LaPlas-CVD at atmospheric pressure
β Scribed by Frank Vollertsen; Knut Partes; Alexej Schubnov
- Book ID
- 107481742
- Publisher
- Springer-Verlag
- Year
- 2009
- Tongue
- English
- Weight
- 378 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0944-6524
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