An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of
Thin films of nanomaterials made using intense cluster beams
β Scribed by D. A. Eastham; I. W. Kirkman; P. M. Denby
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 136 KB
- Volume
- 15
- Category
- Article
- ISSN
- 0268-2605
- DOI
- 10.1002/aoc.157
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β¦ Synopsis
Abstract
Thin films of material containing embedded nanocrystals in the size range from 1.5 to 6β nm have been manufactured using intense cluster beams. A description of the equipment is given, as well as its measured performance. Measurements of the morphology of the material have been made directly using transmission electron microscopy and, indirectly, with SQUID magnetometry. These measurements are consistent with the hypothesis that the material consists of approximately spherical nanocrystals embedded in a matrix. Xβray diffraction measurements have established that the grain size of the matrix material is reduced considerably in these materials. Copyright Β© 2001 John Wiley & Sons, Ltd.
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