๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Thin film electroceramics

โœ Scribed by A. Atkinson; P.T. Moseley


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
642 KB
Volume
65-66
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Deposition of electroceramic thin films
โœ J. Lindner; M. Schumacher; M. Dauelsberg; F. Schienle; S. Miedl; D. Burgess; E. ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 282 KB ๐Ÿ‘ 2 views

MOCVD (metalยฑorganic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ยฎlms, will be a major key technology in the ยฎeld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ยฎeld of MOCVD equipment and process developmen

Control of the thickness distribution of
โœ R. Schmidt; M. Parlak; A.W. Brinkman ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 557 KB

In this work the thickness distribution of NTC thermistor thin films produced by low deposition rate (0.8 nm s -1 ) electron-beam evaporation is investigated. The target preparation, deposition conditions and geometrical set-up of the evaporation mechanism are described in detail. The evaporation ge

ChemInform Abstract: Electroceramics
โœ several authors several authors ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons โš– 22 KB
ChemInform Abstract: Electroceramics
โœ several authors several authors ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons โš– 21 KB