MOCVD (metalยฑorganic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ยฎlms, will be a major key technology in the ยฎeld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ยฎeld of MOCVD equipment and process developmen
โฆ LIBER โฆ
Thin film electroceramics
โ Scribed by A. Atkinson; P.T. Moseley
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 642 KB
- Volume
- 65-66
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
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