Thin Film Diffusion Studied hy High Temperature Electron Probe Microanalysis
nr(lic+nt,rrl to h"frssor Ot,t,n R R l i M M E R on thc. occasion of his 65th )irthdny Diffiisiori i n Thin Film Systrms (TFS) can lie sttidir(1 effectively by means of Electron Probe Microanalysis (EPMA). Using t i heating stage in the microprobe the diffitsion process in the NiCr/Al TFS was studied by the continuous detection of the Ni-, Cr-and Al-X-ray intensity. For the case of long diffusion tinies and taking into account the specific features of the depth clistril)iition of the excitrd X-rays the volume diffitsion coefficient, freqiiericy fwtor ant1 activation energy for the Ni (liffiision i n A l were cletertiiinod. Resitlts for NiCr-AI interdiffrtsion will be siil)mittt=cl.
Die Diffiision in
Diinnschichtsystenien kann tnit der ElektronenstrahliiiikrortnRlyse in relativ einfscher Weise direkt iintrrsiicht werden. Mit einer Heizvorrichtting wiirde aiii System NiCr/Al i n eineiii Mikroanalgsator cliirch kontinuierliche Messiing drr Ni-, Criintl Al-Riintg~iiiritensitiiten tles Difficsionsgcschrhen vcrfolgt. Fiir lange Diffusionszeiteii itncl tinter Benctitiing der fiir dieses Diiiinschichtsystetti gegebenen Spezifika der Tiefenvertei-Iring der angercgteri ctiartsktr~intisctin~~ Riirrtgeiiatrahliing wrrrden Volirindiffiisioiiskoeffizieriten, Frecliietizfsktoi,eri i 1 i i c I Aktivicriiiigsanergieli fiir (lie Ni-Diffilsion i n A1 hestiiiitnt. Aiissngeii ziir Ni(!r-Al-~tit.ertliFfiisioti wertlen gritwwlit,.
The electron probe microanalysis, which was pioneered in the German Democratic Itcpiiblic by Prof. Otto h i j M M F : l t has hpcomc a powerfiil tool for stiidying TFS, too