Atmospheric Pressure CVD of TiSe2 Thin F
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N.βD. Boscher; C.βJ. Carmalt; I.βP. Parkin
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Article
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2006
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John Wiley and Sons
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English
β 341 KB
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Atmospheric pressure (AP) CVD of TiSe 2 films on glass substrates was achieved by reaction of di-tert-butylselenide and diethyl diselenide with TiCl 4 at 250-600 Β°C. All the films showed a TiSe 2 Raman pattern with bands at 133 cm -1 and 198 cm -1 . X-ray diffraction (XRD) showed that the TiSe 2 fil