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Thickness dependent gate oxide quality of thin thermal oxide grown on high temperature formed SiGe

✍ Scribed by Y. Wu; A. Chin; W. Chen

Book ID: 126692879
Publisher: IEEE
Year: 2000
Tongue: English
Weight: 82 KB
Volume: 21
Category: Article
ISSN: 0741-3106
DOI: 10.1109/55.843153

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