Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments

✍ Scribed by H. Zhou; F.G. Shi; B. Zhao

• Book ID: 108360862
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 245 KB
• Volume: 34
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(03)00006-5