Thickness dependence of the quantum yield and attenuation length of photoelectrons in thin indium films
β Scribed by Peisner, J. ;Roboz, P. ;Barna, P. B.
- Publisher
- John Wiley and Sons
- Year
- 1971
- Tongue
- English
- Weight
- 192 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0031-8965
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract The meaning of attenuation length (AL) of xβray photoelectrons (and Auger electrons) in solids is reviewed in the light of new evidence pointing to strong dependences of AL on takeβoff angle and film thickness, which can be traced back to elastic scattering. Since signal attenuation in
Thin oxide Γlms play an important role in the corrosion of metals. Using XPS it is possible in principle to obtain information on the chemical state of near-surface atoms, the stoichiometry of the surface layer and its thickness. A problem is the quantiΓcation of XPS spectra, due to the large uncert