Thermodynamic calculations offer insight in the stability of materials: the annealing behavior of amorphous Ru-Si-O and Ir-Si-O thin films

✍ Scribed by Alexander Pisch; Claude Bernard

• Book ID: 117505235
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 334 KB
• Volume: 25
• Category: Article
• ISSN: 0364-5916
• DOI: 10.1016/s0364-5916(02)00013-5