๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Thermodynamic approach to the chemical vapor deposition process

โœ Scribed by Nong M. Hwang; Duk Y. Yoon


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
609 KB
Volume
143
Category
Article
ISSN
0022-0248

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


A Thermodynamic Estimation of the Chemic
โœ Pavel Peshev ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 164 KB

The temperature dependencies of the change in Gibbs energy for a series of probable reactions of chemical vapor deposition (CVD) of TiB 2 , ZrB 2 , NbB 2 , TaB 2 , and LaB 6 using BCl 3 , BBr 3 , B 2 H 6 , B 5 H 9 , and B 10 H 14 as boron sources have been plotted on the basis of thermodynamic data