Thermodynamic and kinetic properties of indium- implanted silicon III: High temperature diffusion in oxidizing atmospheres

✍ Scribed by G.F. Cerofolini; G.U. Pignatel; F. Riva; G. Feria; F. Nava; G. Ottaviani

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 708 KB
• Volume: 109
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(83)90133-5