𝔖 Bobbio Scriptorium

✦ LIBER ✦

Thermochemical modeling of interfacial reactions and selective deposition at growth from the vapor: J O Carlsson, J Vac Sci Technol, A6, 1988, 1656–1662

Book ID: 103473342
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 158 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90925-1

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth and structure of chemical vapor d

Growth and structure of chemical vapor deposited silicon carbide from methyltrichlorosilane and hydrogen in the temperature range of 1100 to 1400°C: Myoung Gi So and John S Chun, J Vac Sci Technol, A6, 1988, 5–8

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 153 KB