Ceramic thin films containing titanium, vanadium, carbon, oxygen and nitrogen were obtained on steel substrates at 873 K, under nitrogen and helium gases and at low pressure, by chemical vapor deposition (CVD) from two organometallic precursors, CpTiCl 2 N(SiMe 3 ) 2 and Cp 2 VMe 2 (Cp, cyclopentadi
Thermoanalytic studies of the pyrolysis of CpTiCl2N(SiMe3)2 and its use as a precursor for the chemical vapor deposition of titanium carbonitride
✍ Scribed by F. Laurent; J.S. Zhao; L. Valade; R. Choukroun; P. Cassoux
- Book ID
- 107905748
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 737 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0165-2370
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