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Thermal stability of Si/Si1 − x − yGexCy/Si heterostructures grown by rapid thermal chemical vapor deposition

✍ Scribed by Patricia Warren; Jian Mi; Frédéric Overney; Michel Dutoit

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
424 KB
Volume
157
Category
Article
ISSN
0022-0248

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