Thermal stability of group 13 metalorganic MOVPE and CBE precursors

✍ Scribed by Scott Duffy; Philip F. Nolan; Simon A. Rushworth; A. Barry Leese; Anthony C. Jones

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 184 KB
• Volume: 7
• Category: Article
• ISSN: 1616-301X
• DOI: 10.1002/(sici)1099-0712(199709)7:5<233::aid-amo311>3.0.co;2-i

✦ Synopsis

The thermal stabilities of a range of group 13 metalorganic compounds previously used as precursors in metalorganic vapour phase epitaxy (MOVPE) or chemical beam epitaxy (CBE) have been investigated using dierential scanning calorimetry (DSC). For the trialkyl compounds R 3 M the thermal stability decreases in the order M Al b Ga b In and R Me b Et b i Pr b t Bu and the formation of adducts R 3 ML (L OR 2 , NR 3 , etc.) leads to an increase in thermal stability. Dialkylaluminium hydride compounds (e.g. Me 2 AlH) gave the largest energy release. *