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Thermal stability of amorphous ferromagnetic thin films produced by sputtering

✍ Scribed by Shimada, Y. ;Kojima, H.

Book ID
105373111
Publisher
John Wiley and Sons
Year
1978
Tongue
English
Weight
151 KB
Volume
47
Category
Article
ISSN
0031-8965

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Films (220 nm-thick) deposited by reactive rf sputtering from a Ti Si target with an argon / oxygen gas mixture were 3 21 annealed for 30 min in vacuum at temperatures between 400 and 9008C. The films were characterized by 2 MeV He backscattering spectrometry and X-ray diffraction to monitor thermal