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Thermal Conductivity and Specific Heat of Thin-Film Amorphous Silicon

โœ Scribed by Zink, B.; Pietri, R.; Hellman, F.


Book ID
111916888
Publisher
The American Physical Society
Year
2006
Tongue
English
Weight
723 KB
Volume
96
Category
Article
ISSN
0031-9007

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## Abstract We study the influence of highโ€temperature annealing (1100โ€“1200 ยฐC) on the crystallization of nitrogenโ€doped silicon films deposited by LPCVD (lowโ€pressure chemical vapor deposition) at low temperature (465 ยฐC) from disilane Si~2~H~6~ and ammonia NH~3~. Scanning electron microscopy (SEM