Theoretical Study of Recrystallization Process of Amorphous Ge Layer Subjected to Pulsed Excimer (XeCl) Laser Radiation

✍ Scribed by Mrs. D. Klinger; Prof Dr. J. Auleytner; D. Z̊ymierska

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 240 KB
• Volume: 32
• Category: Article
• ISSN: 0232-1300
• DOI: 10.1002/crat.2170320712