The versatile technique of RF plasma etching. Part 11—Kinetics of etchant formation : Adir Jacob. Solid St. Technol. p. 31 (June 1977)

• Book ID: 103273870
• Publisher: Elsevier Science
• Year: 1977
• Tongue: English
• Weight: 121 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(77)90572-8