The use of Hall effect profiling to monitor the reactivation of silicon implants after oxygen implantation in gallium arsenide

✍ Scribed by NJ Whitehead; RM Gwilliam; WP Gillin; BJ Sealy

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 257 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)91110-x