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The ultra-high resolution depth profiling reference material - Ta2O5 anodically grown on Ta

✍ Scribed by M.P. Seah; H.J. Mathieu; C.P. Hunt

Publisher
Elsevier Science
Year
1984
Weight
105 KB
Volume
139
Category
Article
ISSN
0167-2584

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Ta2O5/SiO2 multilayered thin film on Si
Ta2O5/SiO2 multilayered thin film on Si as a proposed new reference material for SIMS depth profiling
✍ Kim, Kyung Joong; Moon, Dae Won 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 406 KB

A delta oxide multilayered thin Ðlm is proposed as a new reference material for SIMS depth proÐling. This material is composed of seven thick layers of 18 nm separated by 1 nm delta layers. The surface of Ta 2 O 5 SiO 2 the thin Ðlm was very Ñat and all the interfaces were sharp according to atomic