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The Temperature Dependence of the Etch Rate of Si Measured by Ellipsometry

✍ Scribed by M. Haverlag; H. Kersten; G. M. W. Kroesen; F. J. de Hoog; A. Rutscher

Publisher
John Wiley and Sons
Year
1991
Tongue
English
Weight
226 KB
Volume
31
Category
Article
ISSN
0005-8025

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