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The technique of depositing thin metallic films very close to each other in a vacuum and application of the method to the manufacture of field-effect transistor

Publisher: Elsevier Science
Year: 1963
Tongue: English
Weight: 70 KB
Volume: 13
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(63)91203-x

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848. The technique of depositing thin metallic films very close to each other in a vacuum and application of the method to the manufacture of field-effect transistors: J. Delinas and M. Chappey, Le Vide, 18 (104), March/April 1963, 89–94

📂 Article 📅 1963 🏛 Elsevier Science 🌐 English ⚖ 131 KB