𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The synthesis and cationic photopolymerization of monomers based on dicyclopentadiene

✍ Scribed by James V. Crivello; Soyoung Song

Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
289 KB
Volume
37
Category
Article
ISSN
0887-624X

No coin nor oath required. For personal study only.

✦ Synopsis

Several new epoxide monomers based on dicyclopentadiene (DCPD) were prepared using straightforward reaction chemistry. Those monomer-bearing groups in addition to the epoxy moiety, which can stabilize free radicals, display a pronounced acceleration of the rate of cationic ring-opening polymerization in the presence of diaryliodonium salt photoinitiators. Mechanistic studies conducted with the aid of model compounds have shown that the apparent rate acceleration is due to the free radical chain-induced decomposition of the photoinitiator. One of the chain carriers in this reaction involves a monomer-derived free radical. Also prepared was dicyclopentadiene monomer (V) bearing polymerizable epoxide and 1-propenyl ether groups in the same molecule. The functional groups in V appear to undergo independent vinyl and epoxide ring-opening polymerization.

πŸ“œ SIMILAR VOLUMES

Synthesis and cationic photopolymerizati
Synthesis and cationic photopolymerization of monomers based on nopol
✍ James V. Crivello; Shao S. Liu πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 216 KB πŸ‘ 2 views

Starting with nopol [(R)-(Οͺ)-2-(2Ј-hydroxyethyl)-6, 6-dimethyl-8-oxatricyclo-[3.1.1.1 2,3 ]octane, I] as a substrate, two new, interesting monomers, allyl nopol ether epoxide III and nopol 1-propenyl ether epoxide IV, were prepared. The photoinitiated cationic polymerizations of these two monomers a

Room-Temperature, Low-Pressure Nanoimpri
Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
✍ X. Cheng; L. J. Guo; P.-F. Fu πŸ“‚ Article πŸ“… 2005 πŸ› John Wiley and Sons 🌐 English βš– 291 KB πŸ‘ 1 views

A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns

Synthesis and curing properties of a nov
Synthesis and curing properties of a novel curing agent based on N-(4-hydroxyphenyl) maleimide and dicyclopentadiene moieties
✍ Jia Liu; Xiao-Liang Zeng; Xu-Yong Zhang; Xin-Nian Xia πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 381 KB πŸ‘ 2 views

A new type of epoxy resin curing agent, containing pendant phenol functions, was synthesized by the free-radical copolymerization of N-(4-hydroxyphenyl) maleimide with dicyclopentadiene (DCPD) monomer in the presence of a radical initiator. The chemical structure was characterized with Fourier trans