✦ LIBER ✦
Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
✍ Scribed by X. Cheng; L. J. Guo; P.-F. Fu
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 291 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0935-9648
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✦ Synopsis
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm are imprinted at room temperature with a pressure of less than 0.1 MPa.