Low temperature growth of thin film coat
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P. Mandracci; F. Mussano; C. Ricciardi; P. Ceruti; F. Pirri; S. Carossa
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Article
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2008
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Elsevier Science
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English
โ 511 KB
In this work we present some results about the low temperature, plasma-assisted growth of silicon-oxygen amorphous thin film alloys (a-SiO x ) on different types of dental materials used for the fabrication of dental prostheses. The a-SiO x films were grown at substrate temperatures lower than 70 ยฐC