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The structural characteristics of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering

✍ Scribed by H. Miyazaki; F. Utsuno; Y. Shigesato; I. Yasui

Book ID: 113205351
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 636 KB
Volume: 281-282
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(96)08669-5

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