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The significance of parallel electric field on the preferred orientation and surface morphology of ZnO thin films

✍ Scribed by H. Kashani

Book ID
110239615
Publisher
Springer
Year
1999
Tongue
English
Weight
421 KB
Volume
18
Category
Article
ISSN
0261-8028

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## Abstract ZnO thin films doped with Li (ZnO:Li) were deposited onto SiO~2~/Si (100) substrates by direct‐current sputtering technique in the temperature range from room temperature to 500 Β°C. The crystalline structure, surface morphology and composition, and optical reflectivity of the deposited