The SCALPEL proof of concept system

✍ Scribed by L.R. Harriott; S.D. Berger; C. Biddick; M.I. Blakey; S.W. Bowler; K. Brady; R.M. Camarda; W.F. Connelly; A. Crorken; J. Custy; R. DeMarco; R.C. Farrow; J.A. Felker; L. Fetter; R. Freeman; L. Hopkins; H.A. Huggins; C.S. Knurek; J.S. Kraus; J.A. Liddle; M. Mkrtychan; A.E. Novembre; M.L. Peabody; R.G. Tarascon; H.H. Wade; W.K. Waskiewicz; G.P. Watson; K.S. Werder; D. Windt

• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 296 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00189-x

✦ Synopsis

We have designed and constructed a projection electron beam lithography system based on the SCALPEL (SCattering with Angular Limitation in Projection Electron beam Lithography) principle. The experimental tool was built to analyze the efficacy of this approach as an alternative to photolithography for future integrated circuit manufacturing. In this paper we will describe the design of the system and show preliminary results of test pattern exposures. We will show printed features down to 0.08 lain as well as lithographic properties, such as depth of focus, which has been measured at 75 lan for 0.25 lain lines and spaces.