The roles of hydrogen and fluorine in the deposition of cubic boron nitride films in the Ar–N2–BF3–H2 system
✍ Scribed by W.J Zhang; S Matsumoto
- Book ID
- 108312086
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 175 KB
- Volume
- 330
- Category
- Article
- ISSN
- 0009-2614
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Thin films of cubic boron nitride (c-BN) can be produced by various PVD and PECVD techniques under several prerequisites referring reportedly to the growth temperature, stoichiometry of the deposited films, and energy impact of the growing surface during film deposition. For reactive magnetron-sputt
## Abstract Boron nitride (BN) films with high crystallinity and phase purity (>80 %) in the cubic phase were synthesized over large areas using fluorine chemistry and electron–cyclotron resonance (ECR) microwave plasma. Plasma‐enhanced fluorine chemistry was provided by a complex H~2~–BF~3~–N~2~–A