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The role of argon involved in plasma-deposited amorphous Si:H films

โœ Scribed by K. Tanaka; S. Yamasaki; K. Nakagawa; A. Matsuda; H. Okushi; M. Matsumura; S. Iizima


Book ID
118331457
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
450 KB
Volume
35-36
Category
Article
ISSN
0022-3093

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