The reduction of hydrogen peroxide at silicon in weak alkaline solutions
β Scribed by J.E.A.M. van den Meerakker
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 487 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0013-4686
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β¦ Synopsis
The reduction of H 2 02 at silicon was studied at 70'C in solutions with a pH of 12.0 . Voltammograms showed that this reaction is very sensitive to the state of the silicon surface . At passivated electrodes the reduction at n-type material proceeds in the dark, while at p-type electrodes illumination is necessary and current doubling is observed . In the active state silicon dissolves chemically in the aqueous solution and reduction of H2 O2 takes place in the dark both at n-and p-type material . A mechanism is proposed, in which charge transfer between H 2 0 2 and intermediates of the dissolution reaction takes place . The chemical dissolution resulted in an extreme change of the surface morphology, exposing various crystallographic facets at the surface .
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