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The production of titania thin film waveguides by dc reactive magnetron sputtering

✍ Scribed by AW Harris; BP Ludden; DCW Blaikley

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
689 KB
Volume
43
Category
Article
ISSN
0042-207X

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πŸ“œ SIMILAR VOLUMES

Characterization of reactive DC magnetro
Characterization of reactive DC magnetron sputtered TiAlN thin films
✍ B. Subramanian; K. Ashok; P. Kuppusami; C. Sanjeeviraja; M. Jayachandran πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 180 KB

## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had