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The process window of a-Si/Ti bilayer metallization for an oxidation-resistant and self-aligned TiSi2 process

✍ Scribed by Lou, Y.-S.; Win, C.-Y.; Cheng, H.-C.

No coin nor oath required. For personal study only.

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Use of silane for the deposition of hard

✍ D. Pilloud; J.F. Pierson; P. Steyer; A. Mege; B. Stauder; P. Jacquot 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 155 KB