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The pressure dependence of the thermal diffusion factor of the system He-octafluorocyclobutane at 300 K

โœ Scribed by Peter J. Dunlop; C.M. Bignell

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
258 KB
Volume
167
Category
Article
ISSN
0378-4371

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โœฆ Synopsis

Thermal diffusion factors, at, are reported for the system He-octafiuorocyclobutane at 300 K as functions of concentration and pressure; some data are also reported for the system He-n-C4H~0. The experimental values are extrapolated to zero pressure and the data used to predict the pressure dependence of a T at each concentration by means of theory of Oost, Los, Cauwenbergh and van Dael.

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Fifty expFcrimentn1 points are presented for the concentration dependence of the binary diffusion coefficient, CD 12, of the system helium-agon at 300ยฐK and 1 atm pressure. These-values of 9 I2 are best represented by a parabola in the mole fraction of argon, x2.