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The Preparation of Titanium-Based Thin Film by CVD Using Titanium Chlorides as Precursors

โœ Scribed by Chi-Young Lee


Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
457 KB
Volume
5
Category
Article
ISSN
0948-1907

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Evaluation of the simultaneous use of Cp
โœ L. Valade; C. Danjoy; B. Chansou; E. Riviรจre; J.-L. Pellegatta; R. Choukroun; P. ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 302 KB

Ceramic thin films containing titanium, vanadium, carbon, oxygen and nitrogen were obtained on steel substrates at 873 K, under nitrogen and helium gases and at low pressure, by chemical vapor deposition (CVD) from two organometallic precursors, CpTiCl 2 N(SiMe 3 ) 2 and Cp 2 VMe 2 (Cp, cyclopentadi