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The preparation of Cu/Al2O3 catalysts via CVD in a fluidized-bed reactor

✍ Scribed by Raoul Naumann d’Alnoncourt; Michael Becker; Jelena Sekulic; Roland A. Fischer; Martin Muhler

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
285 KB
Volume
201
Category
Article
ISSN
0257-8972

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✦ Synopsis

Our ongoing study aims at the preparation of a copper catalyst of industrial interest via chemical vapor deposition of metal-organic precursors in a fluidized-bed reactor. In the present contribution, the preparation of Cu/Al 2 O 3 model catalysts is reported. The used CVD precursors are Cu(II) dialkylamino-2-propoxides containing methyl and ethyl groups, respectively. The substrate used for deposition is a commercial alumina usually applied for chromatography. The samples are characterized using temperature-programmed reduction, reactive frontal chromatography using nitrous oxide, thermogravimetry, elemental analysis and X-ray diffraction. Although high copper loadings up to 10% can be achieved under the applied conditions, no free copper surface area can be found after reduction of catalyst samples.

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