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The potential distribution at the silicon/electrolyte interface in HF solutions

โœ Scribed by P.C. Searson; X.G. Zhang


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
374 KB
Volume
36
Category
Article
ISSN
0013-4686

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โœฆ Synopsis


The potential distribution at the silicon/electrolyte interface was studied in HF solutions using capacitance measurements in conjunction with impedance measurements over a wide frequency range. The electrode impedance was sensitive to the reactions occurring during anodic polarization. The n silicon exhibited a characteristic response of a deep depletion layer up to potentials of several volts. For pm silicon, the impedance was related to the potential drop across the space charge layer and the Helmholtz layer. At more positive potentials, the potential drop across the Helmholtz layer became dominant.


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